Fabrication of submicrometer features on curved substrates by microcontact printing

R J Jackman; J L Wilbur; G M Whitesides

doi:10.1126/science.7624795

Fabrication of submicrometer features on curved substrates by microcontact printing

Science. 1995 Aug 4;269(5224):664-6. doi: 10.1126/science.7624795.

Authors

R J Jackman¹, J L Wilbur, G M Whitesides

Affiliation

¹ Department of Chemistry, Harvard University, Cambridge, MA 02138, USA.

PMID: 7624795
DOI: 10.1126/science.7624795

Abstract

Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.
Research Support, U.S. Gov't, P.H.S.

MeSH terms

Chemistry, Physical / methods*
Dimethylpolysiloxanes / chemistry*
Gold / chemistry*
Silicones / chemistry*
Surface Properties

Substances

Dimethylpolysiloxanes
Silicones
baysilon
Gold

Grants and funding

1-F32 GM16511-01/GM/NIGMS NIH HHS/United States