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Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography.
Opt Express. 2019 Oct 28;27(22):32523-32535. doi: 10.1364/OE.27.032523.
Opt Express. 2019.
PMID: 31684463
Free article.
Improvements on the uniformity of large-area microlens arrays in Fused Silica.
Kirner R, Béguelin J, Eisner M, Noell W, Scharf T, Voelkel R.
Kirner R, et al.
Opt Express. 2019 Mar 4;27(5):6249-6258. doi: 10.1364/OE.27.006249.
Opt Express. 2019.
PMID: 30876213
Free article.
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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source.
Vetter A, Kirner R, Opalevs D, Scholz M, Leisching P, Scharf T, Noell W, Rockstuhl C, Voelkel R.
Vetter A, et al. Among authors: kirner r.
Opt Express. 2018 Aug 20;26(17):22218-22233. doi: 10.1364/OE.26.022218.
Opt Express. 2018.
PMID: 30130918
Free article.
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Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm.
Kirner R, Vetter A, Opalevs D, Gilfert C, Scholz M, Leisching P, Scharf T, Noell W, Rockstuhl C, Voelkel R.
Kirner R, et al.
Opt Express. 2018 Jan 22;26(2):730-743. doi: 10.1364/OE.26.000730.
Opt Express. 2018.
PMID: 29401954
Free article.
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Speckle orientation in paraxial optical systems.
Li D, Kelly DP, Kirner R, Sheridan JT.
Li D, et al. Among authors: kirner r.
Appl Opt. 2012 Feb 1;51(4):A1-10. doi: 10.1364/AO.51.0000A1.
Appl Opt. 2012.
PMID: 22307124
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